http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109415598-B
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1454 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
filingDate | 2017-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2021-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2021-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CN-109415598-B |
titleOfInvention | CMP slurry composition for metal film and polishing method |
abstract | The CMP slurry composition for metal films of the present invention comprises abrasive particles, a solvent, an oxidizing agent, metal ions, and a reducing agent. |
priorityDate | 2016-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 96.