http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109390570-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E60-10 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-625 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-366 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-628 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-386 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M10-052 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01M4-62 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01M10-052 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01M4-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01M4-38 |
| filingDate | 2018-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-109390570-B |
| titleOfInvention | Graphene-coated silicon and preparation method and application thereof |
| abstract | The invention discloses graphene-coated silicon and a preparation method and application thereof, wherein the method comprises the following steps: the silicon particles with the surfaces coated with the silicon oxide passivation films generate silicon particles with positive charges under the modification of a surface modifier, the silicon particles with the positive charges and graphene oxide obtain silicon particles coated with graphene oxide in a self-assembly mode, and finally the silicon particles coated with the graphene oxide are subjected to high-temperature heating reduction treatment in a nitrogen atmosphere to obtain the silicon particles coated with the graphene oxide. According to the preparation method, silicon powder is used as a silicon source, an acid washing step is avoided in the process of preparing graphene coated silicon, no by-product is generated, the production process is environment-friendly, and the silicon utilization rate is high. In addition, the thermal reduction technology of the graphene oxide is mature, so that the production process is more controllable and suitable for large-scale production. |
| priorityDate | 2018-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 76.