| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_664f5b543543aac4cf0153a4ef4e0f85 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-31701 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3171
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-48 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-48 |
| filingDate |
2017-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abc374e7373e80d89bf5e8756dac4cee
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_df5cb96e164fcd8813cfcbebf8d34a08 |
| publicationDate |
2019-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-109362231-A |
| titleOfInvention |
Dopant composition for ion implantation |
| abstract |
The present invention relates to an improved composition for ion implantation. The composition comprises a dopant source and a dopant species, wherein the dopant species, in combination with the dopant gas, produce a beam current of the desired dopant ions. Criteria for selecting auxiliary substances are based on a combination of the following properties: ionization energy, total ionization cross section, bond dissociation energy to ionization energy ratio and a certain composition. |
| priorityDate |
2016-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |