http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109292736-B
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-261 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J20-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B7-0718 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B7-07 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-26 |
filingDate | 2018-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2020-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2020-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CN-109292736-B |
titleOfInvention | Equipment for removing trace moisture in electronic grade hydrogen chloride gas and using method |
abstract | The invention relates to the field of high-purity gas preparation, in particular to equipment for removing trace moisture in electronic-grade hydrogen chloride gas and a using method; the invention discloses equipment for removing trace moisture in electronic-grade hydrogen chloride gas and a using method. In the synthesis process of the material, an alkyl sulfonic acid functionalized compatilizer is used, so that the heteropolyacid salt in the material has better compatibility with a carrier material, and the loading rate is improved. The material has a high specific surface, is stable in hydrogen chloride gas, and does not release secondary pollutants; the method not only can effectively adsorb trace moisture in high-purity hydrogen chloride gas to form crystal water, but also has a hysteresis effect on metal ions in the hydrogen chloride gas. |
priorityDate | 2018-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 62.