http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109292736-B

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J20-22
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-22
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-26
filingDate 2018-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2020-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2020-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-109292736-B
titleOfInvention Equipment for removing trace moisture in electronic grade hydrogen chloride gas and using method
abstract The invention relates to the field of high-purity gas preparation, in particular to equipment for removing trace moisture in electronic-grade hydrogen chloride gas and a using method; the invention discloses equipment for removing trace moisture in electronic-grade hydrogen chloride gas and a using method. In the synthesis process of the material, an alkyl sulfonic acid functionalized compatilizer is used, so that the heteropolyacid salt in the material has better compatibility with a carrier material, and the loading rate is improved. The material has a high specific surface, is stable in hydrogen chloride gas, and does not release secondary pollutants; the method not only can effectively adsorb trace moisture in high-purity hydrogen chloride gas to form crystal water, but also has a hysteresis effect on metal ions in the hydrogen chloride gas.
priorityDate 2018-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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