http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109154778-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D161-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02118 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D161-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-00 |
| filingDate | 2017-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-109154778-B |
| titleOfInvention | Composition for forming resist underlayer film |
| abstract | An object of the present invention is to provide a novel resist underlayer film-forming composition. The solution is a composition for forming a resist underlayer film comprising: a polymer having a repeating structural unit represented by the following formula (1a) and/or formula (1b), and a solvent. [In formulae (1a) and (1b), two R 1 each independently represent an alkyl group, an alkenyl group, an aromatic hydrocarbon group, a halogen atom, a nitro group or an amino group, and the two R 2 each independently represent a hydrogen atom, an alkyl group , alkenyl group, acetal group, acyl group or glycidyl group, R 3 represents an aromatic hydrocarbon group or heterocyclic group which may have a substituent, R 4 represents a hydrogen atom, phenyl group or naphthyl group, and 2 k each independently represent 0 Or 1, m represents an integer of 3 to 500, p represents an integer of 3 to 500, X represents a benzene ring, and the two -C(CH 3 ) 2 - groups bonded to the benzene ring are in a meta- or para-position relationship. ] |
| priorityDate | 2016-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 179.