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filingDate 2017-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2021-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-109071361-B
titleOfInvention Oxide sintered body and sputtering target, and method for producing same
abstract An oxide sintered body in which the contents of zinc, indium, gallium and tin are given as [ Zn ] in the proportions (atomic%) of the total metal elements excluding oxygen]、[In]、[Ga]And [ Sn]When the content is more than or equal to 40 atom% [ Zn ]]Less than or equal to 55 atom percent and less than or equal to 20 atom percent [ In%]Less than or equal to 40 atom percent and less than or equal to 5 atom percent of Ga]Not more than 15 atom%, and not more than 5 atom% [ Sn%]Not more than 20 atomic%, a relative density of 95% or more, and 5 to 20 vol% of InGaZn 2 O 5 As a crystalline phase.
priorityDate 2016-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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