| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05D7-0635
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67207
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67253
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05D11-132 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate |
2017-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_304c2a6d527ce077e7550ac38d71dc3e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37ac91c829467f160288980f686f3f52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56d8f62d224afe9fc15621b0f0dfa8d1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b8b693c0349d363884f14c1f852857e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1135b2a8604366e12287a247866163f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f45b99a71558a2f345209a321b087493 |
| publicationDate |
2018-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-108886001-A |
| titleOfInvention |
Method and assembly for gas flow ratio control |
| abstract |
The method and gas flow control assembly are configured to deliver gases at desired flow ratios to the processing chamber region. In some embodiments, a component includes one or more MFCs and a back pressure controller (BPC). The components include a controller, a process gas source, a distribution manifold, a pressure sensor coupled to the distribution manifold and configured to sense One or more mass flow controllers are connected between the distribution manifold and the processing chamber to control the gas flow between the distribution manifold and the processing chamber, the back pressure controller is connected to one or more mass flow The controllers are arranged in a fluid parallel relationship where precise flow ratio control is achieved. An alternative embodiment includes an upstream pressure controller configured to control the flow of the carrier gas to control the back pressure. Further methods and assemblies for controlling zoned gas flow ratios are described in other aspects. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114174950-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111341689-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111341689-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114174950-A |
| priorityDate |
2016-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |