http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108735622-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67213 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate | 2017-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-108735622-B |
| titleOfInvention | Reaction chamber and semiconductor processing equipment |
| abstract | The invention belongs to the technical field of semiconductor processing, and particularly relates to a reaction chamber and semiconductor processing equipment. The reaction chamber comprises a vacuum sealing barrel and a Faraday shielding cover embedded in the vacuum sealing barrel, wherein a slit penetrating the thickness of the Faraday shielding cover is formed in the Faraday shielding cover, a concave part is formed in the inner wall of the vacuum sealing barrel in a position corresponding to the slit and is used for containing a process byproduct from the slit of the Faraday shielding cover. The reaction chamber has a simpler structure and is easier to process, and the concave part can contain process byproducts from the slit of the Faraday shield, so that the problem of long cleaning and maintenance period of the vacuum sealing barrel is effectively solved, and the coupling efficiency of electromagnetic energy and plasma is higher under the same condition; accordingly, the semiconductor processing equipment formed on the basis has longer cleaning maintenance period and better processing effect. |
| priorityDate | 2017-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 17.