| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a013f27aee93b16ee05c95b0d161b734 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-166
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K59-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K59-35 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-04 |
| filingDate |
2016-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d72fbac98b5884277ff88ae5a821e8a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3e67d949a922fef4574c35ecc2af956 |
| publicationDate |
2018-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-108699670-A |
| titleOfInvention |
Evaporation mask, method of manufacturing vapor deposition mask, and method of manufacturing organic EL display device |
| abstract |
Provided is a vapor deposition mask capable of high-definition patterning by suppressing position shift between a vapor deposition substrate and an arrangement of openings of a vapor deposition mask during vapor deposition, and a method for manufacturing the same. The vapor deposition mask (1) includes a resin film (2) having a pattern of openings (4) on a vapor deposition substrate for forming a thin film pattern by vapor deposition, and the vapor deposition mask (1) includes a ratio of The low-emissivity film (5) of the resin film (2) has a small emissivity, and suppresses the temperature of the resin film (2) caused by radiant heat from the vapor deposition source on at least a part of the surface of the resin film (2) facing the vapor deposition source. rise. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111718663-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111718663-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109913804-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112680696-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112680696-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109182976-A |
| priorityDate |
2016-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |