http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108690984-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-08 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-26 |
| filingDate | 2018-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-108690984-B |
| titleOfInvention | Etching liquid composition and etching method |
| abstract | An object of the present invention is to provide an etching solution composition capable of selectively etching a MoSi film without damaging the Qz substrate, and an etching method using the etching solution composition. An etching solution composition for etching a MoSi film, which contains less than 3.5% by weight of a fluorine compound, water and an iodine-containing oxidant. |
| priorityDate | 2017-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 47.