http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108640117-B

Outgoing Links

Predicate Object
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2002-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2002-85
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B32-984
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B32-984
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y40-00
filingDate 2018-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2022-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2022-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-108640117-B
titleOfInvention Two-dimensional SiC ultrathin nanostructure synthesized by molten salt method with graphene as template and preparation method thereof
abstract The invention relates to a two-dimensional SiC ultrathin nanostructure synthesized by using graphene as a template through a low-temperature molten salt method and a preparation method thereof. According to the method, Si powder is used as a raw material, graphene is used as a template, a mixture of NaCl and NaF is used as a molten salt medium, synthesis is carried out by a molten salt method under the conditions of a certain atmosphere and a low temperature of 1050-1200 ℃, then products containing molten salt are respectively subjected to repeated operations of dissolving, centrifuging, filtering and the like for 3-6 times by water, residual molten salt is removed, and the two-dimensional SiC ultrathin nanostructured semiconductor material can be obtained after drying. When preparing the N-type SiC two-dimensional ultrathin nano-structure material, N is selected 2 Controlling the process to dope the synthetic SiC with N under the atmosphere; when the p-type SiC two-dimensional ultrathin nanostructure material is prepared, B, Al, Ga or Be is added into raw materials under Ar atmosphere to Be used as a doping agent. The two-dimensional SiC nanostructure prepared by the invention can be used for high-frequency and high-power microelectronic devices and lithium ion battery cathode materials in severe environments such as high temperature, high radiation, strong corrosivity and the like.
priorityDate 2018-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5235
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451908603
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23968
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID28486
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID947
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458357694
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID448670727
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556970
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID297
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559581
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5234
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419491870

Total number of triples: 30.