http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108573861-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6831 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68742 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2017-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-108573861-B |
| titleOfInvention | Manufacturing method of semiconductor device, substrate processing apparatus, and recording medium |
| abstract | Provided are a method for manufacturing a semiconductor device, a substrate processing apparatus, and a recording medium capable of appropriately and efficiently performing patterning by self-assembly lithography. including: a step of accommodating the substrate on which the guide pattern is formed in a processing chamber; a first processing step of supplying plasma of a first processing gas to the processing chamber for hydrophilizing or hydrophobicizing the substrate; In the second treatment step, after the first treatment step, supplying plasma of the second treatment gas to the treatment chamber, which is either the hydrophilization treatment or the hydrophobization treatment for the substrate; and after the second treatment step, to the treatment chamber. A step of applying a photoresist material containing two or more kinds of organic materials on a portion of the surface of the substrate where the guide pattern is not formed. |
| priorityDate | 2017-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 32.