http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108550515-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23H5-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
filingDate 2018-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0500b70e1879af6db4a6565c37cc396c
publicationDate 2018-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-108550515-A
titleOfInvention The grinding technics of ion implantation technology cavity
abstract The invention discloses a kind of grinding technics of ion implantation technology cavity, including processing step successively as follows:To the electrolytic polishing of cavity sealing surface, normal pressure cleaning, a high-pressure wash, neutralisation treatment, secondary high-pressure cleaning, steam clean, three times high-pressure wash, drying;The electrolyte used in electrolytic polishing process by mass percent for 60~70% phosphoric acid, 20~30% sulfuric acid and 3~10% the mixed liquor that constitutes of hydrofluoric acid.The present invention treated ion implantation technology cavity, roughness can reach the range of Ra1.0 to 2.0, reduce external waviness, such discharge quantity is few, more effectively ensure that the vacuum degree of cavity.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111650676-B
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111650676-A
priorityDate 2018-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 32.