| abstract |
The invention discloses a kind of solar silicon wafers cleaning solutions, including：Citric acid, neopelex, potassium carbonate, triethylenetetraaminehexaacetic acid, polyethylene glycol, ethyl alcohol, triethanolamine, ammonium fluoride and pure water, parts by weight shared by each ingredient in the solar silicon wafers cleaning solution：20 35 parts of 4 12 parts of citric acid, 5 14 parts of neopelex, 6 12 parts of potassium carbonate, 13 19 parts of triethylenetetraaminehexaacetic acid, 20 29 parts of polyethylene glycol, 20 28 parts of ethyl alcohol, 13 19 parts of triethanolamine, 11 18 parts of ammonium fluoride and pure water.By the above-mentioned means, solar silicon wafers cleaning solution provided by the invention, soil removal efficiency is strong, effectively improves the clean rate of Wafer Cleaning. |