| abstract |
The present invention provides a radiation-sensitive resin composition, a cured film, a pattern forming method, a solid-state imaging device, and an image display device having good sensitivity and excellent temporal stability of sensitivity. The radiation-sensitive resin composition of the present invention includes a resin, a polymerizable compound having an ethylenically unsaturated bond, a photopolymerization initiator, an organic solvent, and water. In the radiation-sensitive resin composition, the photopolymerization initiator contains In the oxime ester compound of at least one group selected from branched alkyl groups and cyclic alkyl groups, the content of water is 0.1 to 2% by mass based on the mass of the radiation-sensitive resin composition. |