http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108363272-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0043 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2018-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-108363272-B |
| titleOfInvention | Composition for forming underlayer film for imprinting and pattern forming method |
| abstract | The invention provides a composition for forming a lower layer film for imprinting, which is suitable for forming a pattern by an etching method, can control the etching selection ratio of the lower layer film to a curable resin layer for nanoimprinting and the etching selection ratio of the lower layer film to a metal film within the most appropriate ranges, and has good coatability on a substrate, and a pattern forming method using the same. A composition for forming an underlayer film for imprint, comprising (A) silica particles, (B) a photopolymerizable compound, (C) a photopolymerization initiator, and (D) a solvent, wherein the content of the (A) silica particles is more than 20 parts by mass and less than 90 parts by mass per 100 parts by mass of the total amount of the (A) silica particles and the (B) photopolymerizable compound. |
| priorityDate | 2017-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 282.