| abstract |
The present invention provides a method for producing a substrate having a surface engraved with a curved pattern using a resin composition capable of forming a resist pattern in a curved shape even in a high-output dry etching process that becomes a high temperature Resist burning and carbonization are not generated during the process, and a cured film having good etching selectivity and post-etching removability can be provided. The present invention relates to a method for producing a patterned substrate, the production method comprising the step of forming a film of a resin composition comprising (A) an alkali-soluble compound selected from the group below on the substrate. Resins, the group consisting of polyimides, polyamideimides, polyimide precursors, polyamideimide precursors, polybenzoxazoles, polybenzoxazole precursors, among the above resins At least two or more copolymers, and at least one of the above-mentioned resins and copolymers of other structural units are composed of (B) a photoacid generator, and (C) are selected from epoxy compounds and oxetane compounds. at least one compound selected from the group consisting of; a step of forming a pattern of the film; a step of patterning the substrate by etching using the pattern of the film as a mask; and a step of removing the film of the resin composition. |