http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108264612-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F251-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B33-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-585 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B33-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F251-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-58 |
| filingDate | 2018-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-108264612-B |
| titleOfInvention | Preparation method of chitosan-poly (2-acrylamide-2-methylpropanesulfonic acid) sodium sulfonate copolymer for monocrystalline silicon texturing |
| abstract | The invention relates to the field of monocrystalline silicon wafer preparation, and discloses a preparation method of a chitosan-poly (2-acrylamide-2-methylpropanesulfonic acid) sodium copolymer for monocrystalline silicon texturing, which comprises the following steps: dissolving chitosan into deionized water, and sequentially adding ammonium ceric nitrate and 2-acrylamide-2-methyl sodium propane sulfonate under the protection of inert gas; and (3) heating for reaction, placing the reaction system in a dialysis bag, dialyzing in deionized water, and freeze-drying and collecting to obtain the copolymer. The chitosan-poly-2-acrylamide-2-methyl sodium propanesulfonate copolymer prepared by the method is used for monocrystalline silicon texturing, the material is green and environment-friendly, the deposition capability of the copolymer on the surface of a silicon wafer can be obviously improved on the premise of not influencing the defoaming effect of the copolymer, the texture pyramid structure is maintained and optimized, the square pyramids on the monocrystalline silicon wafer obtained after texturing are uniform, and the reflectivity of the silicon wafer is low. |
| priorityDate | 2018-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 48.