| abstract |
One aspect of the present invention provides a kind of chemical mechanical polishing liquid, and it includes water, the negatively charged abrasive grains in surface can generate the compound of silver ion, can generate the compound of sulfate ion, peroxide.The present invention significantly improves the stability of polishing fluid, further improves polishing stable degree, improves polishing efficiency, reduce polishing cost by changing the charge of abrasive grains silica surface. |