http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108241257-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2017-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-108241257-B |
| titleOfInvention | Chemically amplified positive photosensitive resin composition, method for producing substrate with mold, and method for producing electroplated molded body |
| abstract | The present invention provides a chemically amplified positive photosensitive resin composition excellent in sensitivity and squareness, a method for producing a substrate with a mold, and a method for producing a plated molded body. The chemically amplified positive photosensitive resin composition includes a resin obtained by copolymerizing a monomer mixture and containing an acid dissociable protective group, a novolak resin, a photoacid generator, and a solvent. Among them, the novolak resin is obtained by the polycondensation of cresol-based aromatic hydroxy compounds and aldehyde compounds, and based on the integral area of the molecular weight of the novolak resin measured by gel permeation chromatography, 100%, in the novolak resin The cresol dikaryon area ranges from 0.5% to 6%. |
| priorityDate | 2016-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 567.