http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108152456-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N33-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N33-00 |
| filingDate | 2017-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-108152456-B |
| titleOfInvention | System and method for measuring adsorption and desorption rate of gas on surface of material |
| abstract | The invention provides a system and a method for measuring the adsorption and desorption rate of gas on the surface of a material, wherein the measuring system comprises a pressure control box, an air pumping system, a gas supply system to be measured and a temperature-controllable QCM measuring system; the air pumping system and the gas supply system to be measured are respectively communicated with the pressure control box through a gas cabin penetrating flange; temperature controllable QCM measurement system crosses the cabin flange through QCM and is connected with the pressure control box, temperature controllable QCM measurement system includes the QCM probe, QCM signal processor and cooler, the metal material that awaits measuring has been plated to the surface wafer among the QCM probe, the cooler passes through cooling line connection QCM probe for the temperature of control surface wafer, utilize this measurement system can realize at low temperature, gaseous accurate measurement at material surface adsorption and desorption rate under the low pressure condition. The measuring method is a measuring method using the measuring system. |
| priorityDate | 2017-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 13.