http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108053397-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ccf18470e954515763d2e63e6fefc65f |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-30148 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-0006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F18-2411 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06T7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06K9-62 |
| filingDate | 2017-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4bd09b0c3d014928b5227ac32bbd39a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c00e52b704dcb31e143639241ddba67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d325746fd08443d60c177683f9efc0ec http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c44bc5a79992b631ff251dc9fe838a2 |
| publicationDate | 2018-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-108053397-A |
| titleOfInvention | A Method of Detecting Weak Points of Photolithography Using Support Vector Machine |
| abstract | The invention discloses a method for detecting photoetching weak points by using a support vector machine, comprising the following steps: S01: on the training chip, an optical scale is used to form a support vector machine: sampling points are defined in a design pattern on the training chip, Calculate the input vector corresponding to each sampling point in the training chip, train the support vector machine, and obtain the hyperplane and classification discriminant function of the support vector machine; S02: use the above support vector machine to detect the design pattern on the chip to be detected: in The point to be detected is defined in the design pattern of the chip to be detected; the input vector corresponding to the point to be detected is calculated and input into the above-mentioned support vector machine, and the support vector machine outputs the calculated value of the classification discriminant function of the point to determine the point to be detected The detection point is a photoetching weak point or a normal point. The method for detecting photoetching weak points provided by the invention can quickly and accurately determine the photoetching weak points in the chip, reduce the burden of designers and shorten the design time. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113408236-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109459912-A |
| priorityDate | 2017-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6918182 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID454112352 |
Total number of triples: 21.