| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6813f68bbadbcaae3828aa035190fede |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F27B17-0025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F27B5-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F27B5-04 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67248
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2686
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67207
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67098
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05B3-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68785
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6719 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate |
2016-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc2c267aedc242d70cf032e6cf60c6d0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f378c36bf99170728ada42a1836bf2d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a197d4d4e9696fcb3fd2e5f531fb7a01 |
| publicationDate |
2018-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-108028200-A |
| titleOfInvention |
Method for improving process uniformity in millisecond annealing systems |
| abstract |
A system and method for improving process uniformity in a millisecond annealing system is provided. In some embodiments, a method for thermally processing a substrate in a millisecond anneal system can include obtaining data indicative of a temperature profile associated with one or more substrates during processing in the millisecond anneal system, the method can include One or more of the following items: (1) changing the pressure in the processing chamber of the millisecond annealing system; (2) manipulating the irradiation distribution by means of the refraction of the water window in the millisecond annealing system; (3) adjusting angular orientation of the substrate; and/or (4) configuration of the shape of the reflector used in the millisecond annealing system. |
| priorityDate |
2015-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |