| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2a0debc0dfa98f6d458dd514d27f3a96 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0582
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-1173
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-013 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0079
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-92
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-061
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2018
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-101
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-0058
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-135
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-30 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-92
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 |
| filingDate |
2016-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_83350dbeb880f9dd8d0bbb120c899d9b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_45aa1efd671377641f54df1b69d9fc40 |
| publicationDate |
2018-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-108027553-A |
| titleOfInvention |
Method for producing etch-resistant patterns on metal surfaces |
| abstract |
A method of forming a metal pattern on a substrate is provided. The method includes applying to a metal surface a chemical surface activation solution having an activator that chemically activates the metal surface; non-impact printing of an etch-resistant ink on the activated surface to produce an etch-resistant mask according to a predetermined pattern, wherein the etch-resistant At least one ink component within the ink undergoes a chemical reaction with the activated metal surface to immobilize a droplet of etch-resistant ink when it hits the activated surface; an etching process is performed to remove unmasked metal not covered by the etch-resistant mask part; and removing the etch resist mask. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113646279-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113646279-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110468413-A |
| priorityDate |
2015-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |