http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107987731-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate | 2017-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-107987731-B |
| titleOfInvention | Polishing solution for 3D polishing of sapphire and preparation method thereof |
| abstract | The invention discloses a polishing solution for sapphire 3D polishing and a preparation method thereof, wherein the polishing solution comprises the following components in percentage by weight: 10-50% of silicon dioxide colloid, 0.01-0.5% of dispersing agent, 0.01-0.5% of oxidizing agent, 0.01-0.2% of complexing agent, 0.01-0.5% of surfactant, 0.01-0.5% of defoaming agent, a proper amount of pH regulator for regulating the pH value to 8.5-11.5, and the balance of deionized water; wherein the particle size of the silicon dioxide colloid is 40-150 nm. The polishing solution is suitable for polishing 3D curved surfaces or slices of sapphire materials by using a 3D light sweeping machine with a soft brush head, has a high viscosity value of 10-15cp (centipoise), can be well attached to the soft brush head on the upper disc of the 3D light sweeping machine, increases the friction probability with the sapphire to be polished, has high polishing efficiency and extremely low sapphire surface quality defect rate, and thus brings an ideal polishing result. |
| priorityDate | 2017-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 68.