http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107957656-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate | 2016-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-107957656-B |
| titleOfInvention | Negative photosensitive resin composition and use thereof |
| abstract | A negative photosensitive resin composition comprising: (A)10 to 50 weight percent of a polysiloxane compound; (B)0.1 to 30 weight percent silicate oligomer; (C)0.1 to 10 weight percent of a photoacid generator, wherein the anionic portion of the photoacid generator is comprised of pentafluorophenyl borate; and (D) the balance solvent. And a use of the negative photosensitive resin composition. |
| priorityDate | 2016-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 35.