http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107936200-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F292-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K47-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K47-32 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K47-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K47-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F230-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F292-00 |
| filingDate | 2017-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-107936200-B |
| titleOfInvention | Method of modifying, mesoporous material and its application of mesoporous silicon |
| abstract | The present invention relates to a kind of method of modifying of mesoporous silicon; it include: that photoinitiator and organic matter are provided; photoinitiator has benzoyl and terminal hydroxy group; the acyl group of terminal hydroxy group and benzoyl is located in contraposition, ortho position or the meta position of the phenyl ring of benzoyl; organic matter has sulfonyl or methoxycarbonyl group; in the first solvent with the first alkaline environment; the hydrogen atom for making sulfonyl or methoxycarbonyl group replace terminal hydroxy group forms sulfonate radical or methoxy sulfonate groups, obtains the photoinitiator of sulfonate radical or the modification of methoxy sulfonate groups；Mesoporous silicon is provided, the surface modification of mesoporous silicon has amino, under the first inert gas shielding, in the second solvent with the second alkaline environment, makes amino substituted sulfonic acid root or methoxy sulfonate groups, thus by photoinitiator modification to the surface of mesoporous silicon；Monomer is provided, under ultraviolet lighting and the second inert gas shielding, so that photoinitiator is formed benzoyl free radical, and cause monomer polymerization, to form polymer molecule brush on the surface of mesoporous silicon. |
| priorityDate | 2017-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 68.