http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107672071-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4230a5830cb918a319556f038f14f83c
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B28D5-0058
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B28D7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B28D5-04
filingDate 2017-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb6d4c1af125ed8bc1191d5720ceab3f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_435c6dadb5e75029901770763271516c
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eaa82675acd8a4d77e3e610b9eda1a43
publicationDate 2018-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-107672071-A
titleOfInvention The method and apparatus of photovoltaic silicon wafer cutting process detection line bow
abstract The present invention proposes a kind of method and apparatus of photovoltaic silicon wafer cutting process detection line bow, can effectively solve the problem that precision deficiency existing for prior art and operates inconvenient problem.The device of detection line bow is the telephoto lens that fixed setting one carries transparent scale outside photovoltaic silicon wafer cutting working region, and there is cross mark in camera lens center;If the visual angle of telephoto lens line of observation bow is θ, by the horizontal range L0 and the height h0 relative to cutting gauze of measuring telescope head to cutting gauze and silicon rod interface point, according to h=L 0 tanθ‑h 0 The θ and h of embodiment corresponding relation calculate and longitudinal height value are marked on transparent scale, that is, are used to directly observe obtaining the value h of line bow.The testing result of the present invention is accurate (precision 1mm);Without switching cutting bin repeatedly in cutting process during detection;Continuous Observation is realized simultaneously, significantly reduces the detection difficulty of technical staff.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112078040-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111923261-A
priorityDate 2017-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 22.