http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107630219-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-136227 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B1-026 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-12 |
| filingDate | 2017-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-107630219-B |
| titleOfInvention | Metal film etching solution composition and method for manufacturing array substrate for display device |
| abstract | The invention provides a metal film etching solution composition and a manufacturing method of an array substrate for a display device, wherein the metal film etching solution composition comprises A) hydrogen peroxide (H) 2 O 2 ) B) a fluorine-containing compound, C) an alkyl tetrazole compound, D) an imidazole compound, E) a water-soluble compound having a nitrogen atom and a carboxyl group in one molecule, F) a sulfate, and G) a polyol-type surfactant, and has a time required for etching termination (End Point Detection; EPD), Side etch (Side etch), and Taper angle (Taper angle) are minimized. |
| priorityDate | 2016-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 149.