http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107523787-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-166 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-042 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-24 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-24 |
| filingDate | 2017-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-107523787-B |
| titleOfInvention | A debugging method and vapor deposition machine |
| abstract | The invention discloses a debugging method and an evaporation machine. The method is used to adjust the relative position between a precision mask plate and a substrate to be operated, comprising: loading the debugging substrate into the debugging evaporation chamber; loading the precision mask plate to the evaporation chamber for debugging; turn on the light source in the evaporation chamber for debugging and irradiate the photochromic layer on the substrate for debugging through a precision mask plate, wherein the part of the photochromic layer irradiated by the irradiated light The region is discolored; according to the position of the discolored part of the photochromic layer, the compensation value of the precision mask is obtained. The above method can save organic materials during adjustment and improve the debugging speed. |
| priorityDate | 2017-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.