http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107510646-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7601d2b4c56938b3bbe65f1dc2c3db8f |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K2800-84 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K2800-805 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K8-97 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K8-64 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K8-99 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61Q19-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61Q19-08 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K8-64 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K8-99 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K8-9789 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61Q19-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61Q19-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K8-9771 |
| filingDate | 2017-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-107510646-A |
| titleOfInvention | Facial mask is repaired in a kind of moisturizing |
| abstract | The invention discloses a kind of moisturizing to repair facial mask, and it includes the composition of following mass percent：Peanut dregses extract 0.1~1.2%,Penicillin mushroom dregs extract 0.1~1.1%,Ginkgo dregs of a decoction extract 0.1~1%,Glycerine 3~8%,Butanediol 3~8%,1,3 propane diols 3~8%,Trehalose 0.1~1%,1,2 pentanediols 0.3~0.8%,Hydroxyethyl cellulose 0.2~0.8%,The rilanit specials 1~5% of PEG 40,The butylol polyethers 26 0.1~0.5% of PPG 26,Phenoxyethanol 0.3~0.8%,Biological carbohydrate gum 1 0.001~0.03%,Anjidew NL50 0.2~0.6%,Sodium lactate 0.3~3%,Sodium Hyaluronate 0.01~0.04%,Sensiva SC50 0.05~0.1%,Calcium chloride 0.1~0.5%,Magnesium chloride 0.1~0.5%,Potassium hydroxide 0.1~0.5%,Citric acid 0.1~0.4%,EDETATE SODIUM 0.01~0.1%,Deionized water surplus.Long-term use of facial mask of the present invention, can effectively facilitate skin renewal reparation, anti-aging, and moisturizing increases bullet, at the same also can anti-inflammatory anti-acne, the damage of skin quality. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111297726-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111297726-B |
| priorityDate | 2017-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 80.