| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6b822ee046eb6c45d1e3bd9ce9c1782e |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-3286
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-3284 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-453
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7869
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-64
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78696
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B28B11-243
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-086
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66969
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02565
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3414
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-345
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02631 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 |
| filingDate |
2012-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1529047f378776a1c4c296aff77d717b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21747acfb77b0d181ab4dff0d66658d4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cf0a77ffc22328298fb7190ebe0dee35
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94be08b26f8d4214f1b952ccdf04b9f1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_09932973f1b813ee358d0f722fee1a93
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ab94ab226b45df4ba747bc2c5b4643a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eeb28b9ce64a0bca4e70ad5d796b2f27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8cd54b123a684f895f190136e9ca3c5f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9b8a324c292e8d8eaa4da36f7357b77 |
| publicationDate |
2017-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-107419225-A |
| titleOfInvention |
Sputtering target, manufacturing method of sputtering target, and thin film forming method |
| abstract |
A transistor using an oxide semiconductor may sometimes be less reliable than a transistor using amorphous silicon. Accordingly, an object of the present invention is to manufacture a semiconductor device having a highly reliable transistor using an oxide semiconductor. An oxide semiconductor film formed by a sputtering method using a sputtering target comprising a method having a c-axis parallel to an upper surface of an oxide semiconductor produced by mixing raw materials at a composition ratio capable of obtaining a crystal structure Oxide semiconductors in the crystalline region of the vector. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112106134-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112106134-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109540969-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109540969-B |
| priorityDate |
2011-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |