| abstract |
The present invention relates to the passivation of nonlinear optical crystals. An embodiment of the present invention includes an exposure chamber configured to contain a passivation gas having a selected concentration of hydrogen, the exposure chamber further configured to contain at least An NLO crystal; a source of passivation gas, which is fluidly connected to the exposure chamber, configured to supply passivation gas to an interior portion of the exposure chamber; and a substrate, which is configured to The NLO crystal is held within the chamber, the substrate is further configured to maintain a temperature of the NLO crystal at or near a selected temperature that is below a melting temperature of the NLO crystal. |