| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N30-2047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N15-10 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N30-852
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02345
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-161
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-1634
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-1642
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-1645
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N30-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-1629
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-1628
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N30-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-1631
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N30-093
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N30-078
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N30-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-1646
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-14 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-113
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-187
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41J2-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41J2-16 |
| filingDate |
2015-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2020-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2020-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-107251254-B |
| titleOfInvention |
Crystal pattern forming method, piezoelectric film manufacturing method, piezoelectric element manufacturing method, and liquid discharge head manufacturing method |
| abstract |
[Problem] A method for forming a crystal pattern at a predetermined position with high accuracy is provided. [Solution] A crystal pattern forming method includes: an electromagnetic wave absorbing layer forming process for forming an electromagnetic wave absorbing layer on one of the surfaces of a substrate; an amorphous film forming process for forming an amorphous film on the electromagnetic wave absorbing layer; with a mask forming process for forming an electromagnetic wave blocking mask for blocking electromagnetic waves on the other of the surfaces of the substrate; and for irradiating the substrate with electromagnetic waves from the other of the surfaces of the substrate through the electromagnetic wave blocking mask A crystallization process to crystallize a given region in an amorphous film. |
| priorityDate |
2015-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |