| abstract |
The present invention relates to compounds of formula (I) and (IA), wherein X is -O(CO)-; R 1 is C 1 -C 12 haloalkyl or C 6 -C 10 haloaryl; R 2 is located in Coumarin The 7th position of the prime ring is OR 8 ; R 2 a, R 2 b and R 2 c are independently hydrogen; R 3 is C 1 ‑C 8 haloalkyl or C 1 ‑C 8 haloalkyl; R 4 is hydrogen; and R 8 is C 1 -C 6 alkyl; it is suitable as the preparation photoresist composition (such as for example for preparing spacer, isolation layer, interlayer dielectric film, insulating layer, planarization layer, Photosensitive acid donors in protective layers, topcoats, electroluminescent displays and storage cells of liquid crystal displays (LCDs). |