| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45544
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45561
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45565
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate |
2015-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24dcbd9380e4964d48abc1ea43205d5c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa04ae88d92e7c00e61a86ccbb75ea8c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_76ec784bf99e53c4df7104d4d4479a8d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_19774b828bcaeda17b4d1b28af01c5f6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b1be52bfeeb256aa7b10612a662c7bc8 |
| publicationDate |
2017-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-107148661-A |
| titleOfInvention |
Gas supply delivery unit including gas diverter for adjustable gas flow control |
| abstract |
A gas supply delivery for a plasma processing system for processing a substrate with gases introduced through at least first, second and third gas injection regions includes a process gas supply inlet and a conditioning gas inlet. The mixing manifold includes a gas stick in fluid communication with the process gas supply and a conditioning gas stick in fluid communication with the conditioning gas supply. The first gas outlet delivers gas to a first gas injection zone, the second gas outlet delivers gas to a second gas injection zone, and the third gas outlet delivers gas to a third gas injection zone. The gas splitter is in fluid communication with the mixing manifold and includes a first valve arrangement that splits the mixed gas exiting the mixing manifold into a first mixed gas supplied to the first gas outlet and a first mixed gas supplied to the second and/or Or the second mixed gas from the third outlet. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110573654-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111492469-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113834901-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112204167-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I771798-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11761082-B2 |
| priorityDate |
2014-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |