http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107145037-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-021 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-021 |
| filingDate | 2017-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-107145037-B |
| titleOfInvention | Photoresist composition and preparation method thereof |
| abstract | The invention relates to the technical field of macromolecules, in particular to a photoresist composition and a preparation method thereof. The photoresist composition according to the present invention comprises: 30-45 parts of resin, 0.02-0.2 part of background dye and 55-70 parts of organic solvent; the resin comprises photosensitive resin and film-forming resin, and the photosensitive resin comprises diazonaphthoquinone resin and diphenylamine diazo resin. |
| priorityDate | 2017-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 74.