http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107109639-B
Outgoing Links
Predicate | Object |
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classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B5-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-086 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-5806 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-562 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-5826 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F3-041 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B7-025 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B5-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B13-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06F3-041 |
filingDate | 2016-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2019-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2019-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CN-107109639-B |
titleOfInvention | The manufacturing method of substrate with transparent electrode and the substrate with transparent electrode |
abstract | The present invention provides a kind of substrate with transparent electrode, which has metal-oxide transparent electrode layer (13) on transparent substrate (12).The average highest curvature Ssc on the surface of transparent electrode layer is preferably 5.4 × 10 ‑4 nm ‑1 Below.For example, if implementing the surface treatment of the sputtering using low discharge power after film is at transparent electrode layer, then can reduce the Ssc of transparent electrode layer.It is excellent in the adaptation of transparent electrode layer (13) and the metal being arranged on extraction wiring (14) for the substrate of the invention with transparent electrode.Transparent electrode layer (13) after implementing transparent electrode film making process, applies the second discharge power, implements surface treatment procedure and obtain for example by applying the first discharge power. |
priorityDate | 2015-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 31.