http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107109639-B

Outgoing Links

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filingDate 2016-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2019-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2019-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-107109639-B
titleOfInvention The manufacturing method of substrate with transparent electrode and the substrate with transparent electrode
abstract The present invention provides a kind of substrate with transparent electrode, which has metal-oxide transparent electrode layer (13) on transparent substrate (12).The average highest curvature Ssc on the surface of transparent electrode layer is preferably 5.4 × 10 ‑4 nm ‑1 Below.For example, if implementing the surface treatment of the sputtering using low discharge power after film is at transparent electrode layer, then can reduce the Ssc of transparent electrode layer.It is excellent in the adaptation of transparent electrode layer (13) and the metal being arranged on extraction wiring (14) for the substrate of the invention with transparent electrode.Transparent electrode layer (13) after implementing transparent electrode film making process, applies the second discharge power, implements surface treatment procedure and obtain for example by applying the first discharge power.
priorityDate 2015-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 31.