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filingDate 2015-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2020-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2020-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-107108824-B
titleOfInvention Method for synthesizing block copolymer and application thereof in nano photoetching
abstract Method for controlling the synthesis of a block copolymer comprising at least two blocks, including at least one apolar block and at least one polar block, which makes it possible in particular to control the ratio between the blocks and the molecular weight of the individual blocks, the copolymer being a block copolymer intended to be used as a mask in a nanolithography process by direct self-assembly (DSA), the control being achieved by semi-continuous anionic polymerization in an aprotic apolar medium and comprising the following steps: -synthesizing a first apolar block in the form of a macroinitiator, -preparing a solution of a previously synthesized macroinitiator by mixing it with an alkali metal alkoxide in an aprotic apolar solvent, -preparing a solution of a polar monomer in an aprotic apolar solvent, -injecting the two previously prepared solutions of the macroinitiator and the polar monomer in a constant flow ratio into a micromixer connected to the polymerization reactor, -recovering the obtained copolymer.
priorityDate 2014-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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