| abstract |
Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material, and structural properties, and new methods of making the same. According to one or more embodiments of the present disclosure, it has been discovered that polishing pads with improved properties can be produced by additive manufacturing processes, such as three-dimensional (3D) printing processes. Accordingly, embodiments of the present disclosure can provide advanced polishing pads having discrete features and geometries formed from at least two different materials including functional polymers, functional oligomers, reactive diluents, and cured agent. For example, the advanced polishing pad can be formed from a plurality of polymer layers by automated sequential deposition of at least one resin precursor composition, followed by at least one curing step, wherein each layer can represent at least one polymer composition and/or regions of different composition. |