http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107075310-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F11-144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-321 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
| filingDate | 2015-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-107075310-B |
| titleOfInvention | Cobalt Sag Control Agent |
| abstract | The present invention provides a chemical mechanical polishing composition comprising: (a) abrasive particles; (b) a cobalt corrosion inhibitor; (c) a cobalt dishing control agent, wherein the cobalt dishing control agent comprises an anionic head group and C13 - C20 aliphatic tail; (d) an oxidizing agent that oxidizes cobalt; and (e) water, wherein the polishing composition has a pH of about 3 to about 8.5. The present invention further provides a method for chemical mechanical polishing of a substrate using the chemical mechanical polishing composition of the present invention. Typically, the substrate contains cobalt. |
| priorityDate | 2014-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 48.