| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cbffa3b81b3b862dc7220b5648f5f745 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B12-053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B12-482
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B12-485 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67288
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01Q60-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01Q60-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01Q70-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01Q60-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-12 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01Q60-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 |
| filingDate |
2017-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_28f24dd6a82bc248221603197f891ad6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f5122804e33027e320e6fbad347531a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8b71e606fd7f7a9b5a175a7f2cb4550b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1fcaf1b8f3fd089b6e48b42876484437
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e440e4b59a4e2ccf38a4a093ee094414
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3e443992259077115b92f041041fadf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8461f071e0f701b46e15a2b22e478895 |
| publicationDate |
2017-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-107064564-A |
| titleOfInvention |
Cantilever device, inspection device, method for analyzing a surface, and micropatterning method |
| abstract |
The present invention provides a method of forming a micropattern, a substrate surface inspection device, a cantilever device for an atomic force microscope, a method of analyzing a surface of a semiconductor substrate, and a probe tip. The method for forming a micropattern includes forming pinning patterns on a semiconductor substrate; forming a neutral pattern layer in spaces between the pinning patterns; and inspecting the surface of a guide layer including pins by using an atomic force microscope (AFM). Tie pattern and neutral pattern layers. |
| priorityDate |
2016-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |