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filingDate 2017-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2020-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2020-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-107024835-B
titleOfInvention Photoresist composition and preparation method thereof, OLED array substrate and preparation method thereof
abstract A photoresist composition and a preparation method thereof, an organic light emitting diode (OLED) array substrate and a preparation method thereof, the photoresist composition comprises: an alkali-soluble resin, a photosensitive monomer, a thermochromic pigment and a solvent, the alkali-soluble The mass percentage of resin is 10wt% to 30wt%, the mass percentage of photosensitive monomer is 1wt% to 12wt%, the mass percentage of thermochromic pigment is 5wt% to 20wt%, and the mass percentage of solvent It is 40wt% to 65wt%; the color of the thermochromic pigment will deepen under the condition of heating. When the pixel defining layer is formed from the photoresist composition, before the post-baking process is performed on the pixel defining layer film, it can transmit light to improve the alignment accuracy; after the pattern of the pixel defining layer is formed, the During the post-baking process, the thermochromic pigment in the pixel defining layer will undergo irreversible color change, so that the color of the pixel defining layer is deepened to achieve the effect of shading.
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