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filingDate 2016-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2020-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2020-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-107017255-B
titleOfInvention Nitride semiconductor device and method of manufacturing the same
abstract The present invention relates to a nitride semiconductor device including a conductive substrate and a nitride semiconductor layer. The nitride semiconductor layer exists on the conductive substrate. The nitride semiconductor layer includes a lateral-type first transistor structure and a lateral-type second transistor structure. The conductive substrate includes a first potential control region and a second potential control region, and the second potential control region can independently perform potential control with respect to the first potential control region. In a plan view of the nitride semiconductor layer, the first transistor structure overlaps the first potential control region, and the second transistor structure overlaps the second potential control region.
priorityDate 2015-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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