http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107004560-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-2001 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32715 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32724 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32522 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate | 2015-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-107004560-B |
| titleOfInvention | Method and system for improving process uniformity |
| abstract | A semiconductor processing chamber may include a remote plasma region, and a processing region fluidly coupled to the remote plasma region. The processing area may be configured to receive the substrate on the support base. The support base may comprise a first material at an inner region of the base. The support base may also include an annular member coupled to a remote portion of the base or at an outer region of the base. The annular member may comprise a second material different from the first material. |
| priorityDate | 2014-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.