| abstract |
An object of the present invention is to provide a composition for forming a resist underlayer film for lithography that can be used as a hard mask. By including a trihaloacetamide skeleton, the pattern resolution can be improved. A method for solving the problem of the present invention relates to a composition for forming a resist underlayer film for lithography comprising a hydrolyzable silane as a silane, a hydrolyzate thereof, a hydrolyzate condensate thereof, or a combination thereof, the hydrolyzable silane Contains silanes having halogen-containing carboxylic acid amide groups. |