http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107003612-B
Outgoing Links
Predicate | Object |
---|---|
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01R33-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-0025 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C39-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-00 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C39-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2015-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2020-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2020-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CN-107003612-B |
titleOfInvention | Photosensitive composition for resist underlayer film formation and resist underlayer film |
abstract | To provide a photosensitive composition for forming a resist underlayer film, which is excellent in dry etching resistance and heat resistance, and which is easy to control the alkali solubility, and a resist underlayer film. Specifically, there is provided a photosensitive composition for forming a resist underlayer film containing a compound selected from the group consisting of a compound represented by the following general formula (1) and a compound represented by the following general formula (2). A novolak-type phenolic resin obtained by reacting one or more phenolic trinuclear compounds (A) and aldehydes (B) in the group under an acid catalyst. [In the formula, R 1 , R 2 and R 3 each independently represent an optionally substituted alkyl group having 1 to 8 carbon atoms, and R 4 represents a hydrogen atom, an optionally substituted alkyl group or an optionally substituted alkyl group In the aryl group of the substituent, p and q are each independently an integer of 1 to 4, r is an integer of 0 to 4, and s is 1 or 2. However, the sum of r and s is 5 or less. ] |
priorityDate | 2014-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 721.