| abstract |
The present invention relates to a kind of method that utilization atmos low-temperature plasma improves capacitor energy storage density, including：By pending capacitor film cleaning, dry；Selected atmos low-temperature plasma produces equipment, and the capacitor film is positioned over into the plasma generating area that atmos low-temperature plasma produces equipment；The species of selected high voltage power supply, predecessor and working gas, and adjust discharge parameter and working gas flow velocity；Carry out plasma-deposited processing.The present invention using atmos low-temperature plasma handle capacitor film, capacitor film surface breakdown field intensity can improve 17% and more than, energy storage density improve 23% and more than. |