http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106933067-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b574329dca6040402d091ad9db766a5c |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-426 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
filingDate | 2015-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ae25fae69843c6a7bf288c979dd06c32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5bb5da54475a69da65a90f60b1680292 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c6ebac4d078154ddb384b75e5707bf16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc052b641991da43d87dff5b5c951b53 |
publicationDate | 2017-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CN-106933067-A |
titleOfInvention | A kind of photoresistance residual washing liquid composition rich in water |
abstract | The invention discloses a kind of cleaning liquid composition for removing photoresistance etch residues, it is included:(a) hydramine (b) solvent (c) water (d) phenolic compound (e) surfactant.The cleaning liquid composition is rich in water and non-fluoride and azanol; can quickly remove because hard baking, dry etching, ashing and Plasma inpouring cause complicated chemical to change; and crosslink the photoresist of hardening; and while the photoresistance residue on metal wire (Metal), through hole (Via) and metal gasket (Pad) wafer is removed can be realized; for base material (such as metallic aluminium; nonmetallic silica etc.) do not attack substantially, there is good protective effect especially for metallic aluminium.Cleaning fluid of the invention has a good application prospect in fields such as cleaning semiconductor chips. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109097201-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108212914-A |
priorityDate | 2015-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 110.