http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106750297-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K2201-011 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K9-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-124 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K9-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K3-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-12 |
| filingDate | 2016-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-106750297-B |
| titleOfInvention | A kind of low dielectric bismaleimide resin system and preparation method thereof |
| abstract | The invention discloses a kind of low dielectric bismaleimide resin systems and preparation method thereof, using bismaleimide, allyl compound, mesoporous silicon oxide, polyphenylene oxide as raw material, by preparing the coating mesoporous silica of polyphenylene oxide, and bismaleimide resin system is applied it to, prepare low dielectric high-performance bismaleimide resin system；Method disclosed by the invention has the characteristics that simple process, applicability are wide, and prepared material has a wide range of applications potentiality in Aeronautics and Astronautics and electronic field. |
| priorityDate | 2016-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 53.